Chipavg: Measurements of the thickness of the oxide layer of...

In BSDA: Basic Statistics and Data Analysis

Measurements of the thickness of the oxide layer of manufactured integrated circuits

Description

Data for Exercises 6.49 and 7.47

Usage

Chipavg

Format

A data frame/tibble with 30 observations on three variables

wafer1

thickness of the oxide layer for wafer1

wafer2

thickness of the oxide layer for wafer2

thickness

average thickness of the oxide layer of the eight measurements obtained from each set of two wafers

Source

Yashchin, E. 1995. “Likelihood Ratio Methods for Monitoring Parameters of a Nested Random Effect Model.” Journal of the American Statistical Association, 90, 729-738.

References

Kitchens, L. J. (2003) Basic Statistics and Data Analysis. Pacific Grove, CA: Brooks/Cole, a division of Thomson Learning.

Examples

EDA(Chipavg$thickness)
t.test(Chipavg$thickness, mu = 1000)
boxplot(Chipavg$wafer1, Chipavg$wafer2, name = c("Wafer 1", "Wafer 2"))
shapiro.test(Chipavg$wafer1)
shapiro.test(Chipavg$wafer2)
t.test(Chipavg$wafer1, Chipavg$wafer2, var.equal = TRUE)

BSDA documentation built on Sept. 19, 2023, 1:08 a.m.