Plasma: Plasma Etching
In mtorchiano/lmPerm: Permutation Tests for Linear Models
Description
Usage
Details
Author(s)
References
Description
An experiment designed to guide optimization of a nitride etch process
Usage
1
Details
An orthogonal arry, capable of supporting a linear model only. The
factors are denoted by their units of measurement. They were W,
the power applied to the cathode; mTorr, the pressure
in the reaction chamber; cm, gap between anode and cathode; sscm, flow
if the reactant gas. The three responses: Amin, etch rate; Pct, unifomity;
sinpoly, selectivity.
Author(s)
Bob Wheeler bwheelerg@gmail.com
References
Vardeman, Stephen B. (1994).Statistics for engineering problem solving.
PWS publishing Co. Boston. p 596
mtorchiano/lmPerm documentation built on March 2, 2020, 7 p.m.
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Description Usage Details Author(s) References
Description
An experiment designed to guide optimization of a nitride etch process
Usage
1 |
Details
An orthogonal arry, capable of supporting a linear model only. The factors are denoted by their units of measurement. They were W, the power applied to the cathode; mTorr, the pressure in the reaction chamber; cm, gap between anode and cathode; sscm, flow if the reactant gas. The three responses: Amin, etch rate; Pct, unifomity; sinpoly, selectivity.
Author(s)
Bob Wheeler bwheelerg@gmail.com
References
Vardeman, Stephen B. (1994).Statistics for engineering problem solving. PWS publishing Co. Boston. p 596
R Package Documentation
Browse R Packages
We want your feedback!
Note that we can't provide technical support on individual packages. You should contact the package authors for that.
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