STAT210prob2.33: STAT210prob2.33: Etch Uniformity on Silicon Wafers

In thoree/stat340: Data and functions for BIAS at NMBU

STAT210prob2.33: Etch Uniformity on Silicon Wafers

Description

This data consists of 20 observations on etch uniformity on silicon wafers taken during a qualification experiment for a plasma etcher.

Usage

STAT210prob2.33

Format

A data frame with 20 observations (rows) and 1 variable (column).

	Column name	Data type	Description	Values
[,1]	Uniformity	numeric	The observed uniformity	(4.39 - 7.55)

Details

This is data from Exercise 2.33 in Design and Analysis of Experiments, 9th Edition, EMEA Edition.

Source

Montgomery, D. C. (2019) Design and Analysis of Experiments, 9th Edition, EMEA Edition. New York: Wiley.

See Also

STAT210prob2.29, STAT210example3.1, STAT210prob2.31, and STAT210prob2.39

Examples

# Structure of the object
str(STAT210prob2.33)

# A short summary of the variables
summary(STAT210prob2.33)

thoree/stat340 documentation built on June 30, 2024, 4:04 p.m.