R/STAT210prob2.33.R

In thoree/stat340: Data and functions for BIAS at NMBU

#' STAT210prob2.33: Etch Uniformity on Silicon Wafers
#'
#' This data consists of 20 observations on etch uniformity on silicon wafers
#' taken during a qualification experiment for a plasma etcher.
#'
#' @format A data frame with 20 observations (rows) and 1 variable (column).
#' \tabular{llllr}{
#'   \tab \bold{Column name} \tab \bold{Data type} \tab \bold{Description} \tab \bold{Values}\cr
#'   \code{[,1]} \tab \code{Uniformity} \tab numeric \tab The observed uniformity \tab (4.39 - 7.55)
#' }
#'
#' @details
#'
#' This is data from Exercise 2.33 in Design and Analysis of Experiments, 9th
#' Edition, EMEA Edition.
#'
#' @seealso `STAT210prob2.29`, `STAT210example3.1`, `STAT210prob2.31`, and `STAT210prob2.39`
#'
#' @examples
#'
#' # Structure of the object
#' str(STAT210prob2.33)
#'
#' # A short summary of the variables
#' summary(STAT210prob2.33)
#'
#' @source Montgomery, D. C. (2019) \emph{Design and Analysis of Experiments,
#' 9th Edition, EMEA Edition}. New York: Wiley.
#'
#' @docType data
#' @keywords datasets
#' @name STAT210prob2.33
#' @usage STAT210prob2.33
#'
"STAT210prob2.33"