modif2: Apply material editing effect (For advanced users)

In materialmodifier: Apply Photo Editing Effects

Apply material editing effect (For advanced users)

Description

This function allows you to specify which image components to edit in more detail than the modif function. Please refer to the information on the package's Github page for detailed usage and theoretical background.

Usage

modif2(
  im,
  params,
  mask = NA,
  max_size = 1280,
  log_epsilon = 1e-04,
  filter_epsilon = 0.01,
  logspace = TRUE
)

Arguments

im	An input image.
params	A list of parameter values. Parameter names are freq, amp, sign, and strength.
mask	If set, only the area of white pixels in the mask image will be edited.
max_size	If the shorter side of the input image is larger than this value (the default is 1280), input image is resized. The modif function is very slow for large-resolution images.
log_epsilon	Offset for log transformation (default is 0.0001). Need not to change this value in most cases.
filter_epsilon	Epsilon parameter of the Guided filter (default is 0.01). Need not to change this value in most cases.
logspace	If TRUE (default), image processing is done in the log space. If FALSE, computation is performed without log transformation.

Value

an output image

Examples

# shine effect
shine = list(freq = "H", amp = "H", sign = "P", strength = 2)
plot(modif2(face, params = shine))

# shine effect (equivalent to the above)
shine2 = list(freq = 1:4, amp = "H", sign = "P", strength = 2)
plot(modif2(face, params = shine2))

# you can specify a feature name directly, instead of specifying freq/amp/sign separately
plot( modif2( face, params = list( feature = "HHA", strength = 2 ) ) )
plot( modif2( face, params = list( feature = "1HP", strength = 3 ) ) )

# apply multiple effects at the same time
blemish = list(feature = "HLA", strength = 0.1) # less blemish
smooth = list(feature = "HHN", strength = 0.2) # smoother
plot(modif2(face, params = list(blemish, smooth)))

materialmodifier documentation built on May 31, 2023, 9:46 p.m.