Description Usage Format References
An experiment on integrated circuits was reported by Phadke et al. (1983). The width of lines made by a photoresist-nanoline tool were measured in five different locations on silicon wafers, measurements being taken before and after an etching process being treated separately. Here, the pre-etching data are analyzed. The eight experimental factors (A-H) were arranged in an L18 orthogonal array and produced 33 measurements at each of five locations, giving a total of 165 observations. There were no whole-plot (i.e. between-wafer) factors.
1 | data("circuit")
|
A data frame with 165 observations on the following 13 variables.
Width
width of lines made by a photoresist-nanoline tool
A
a factor A with levels 1
, 2
and 3
B
a factor B with levels 1
, 2
and 3
C
a factor C with levels 1
, 2
and 3
D
a factor D with levels 1
, 2
and 3
E
a factor E with levels 1
, 2
and 3
F
a factor F with levels 1
, 2
and 3
G
a factor G with levels 1
, 2
and 3
H
a factor H with levels 1
, 2
and 3
I
a factor I with levels 1
, 2
and 3
Wafer
wafers indenfifier
waf
replication number for two replicates
exp
experiment number for differenct array
Phadke, M.S., Kacka, R.N., Speeney, D.V. and Grieco, M.J. (1983). Off-line quality control for integrated circuit fabrication using experimental design. Bell System Technical Journal, 62, 1273–1309.
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