problem2.31: problem2.31
In nganbaohuynh/stat210: Datasets for the course STAT210 (NMBU)
problem2.31 R Documentation
problem2.31
Description
Data from Exercise 2.31 in "Montgomery, D. Design and Analysis of Experiments. 9th Ed. Wiley."
Usage
problem2.31
Format
Photoresist is a light0sensitive material applied to semi-conductor
wafers so that the circuit pattern can be imaged on to the wafer. After application,
the coated wafers are baked to remove the solvent in the photoresist mixture and to harden the resist.
Data are the measuremnets of photoresist thickness (in kA) for eight wafers baked at two different temperatures.
Assume that all of the runs were made in random order.
Examples
summary(problem2.31)
nganbaohuynh/stat210 documentation built on Aug. 20, 2022, 10:08 p.m.
R Package Documentation
Browse R Packages
We want your feedback!
Note that we can't provide technical support on individual packages. You should contact the package authors for that.
| problem2.31 | R Documentation |
problem2.31
Description
Data from Exercise 2.31 in "Montgomery, D. Design and Analysis of Experiments. 9th Ed. Wiley."
Usage
problem2.31
Format
Photoresist is a light0sensitive material applied to semi-conductor wafers so that the circuit pattern can be imaged on to the wafer. After application, the coated wafers are baked to remove the solvent in the photoresist mixture and to harden the resist. Data are the measuremnets of photoresist thickness (in kA) for eight wafers baked at two different temperatures. Assume that all of the runs were made in random order.
Examples
summary(problem2.31)
R Package Documentation
Browse R Packages
We want your feedback!
Note that we can't provide technical support on individual packages. You should contact the package authors for that.
Embedding an R snippet on your website
Add the following code to your website.
For more information on customizing the embed code, read Embedding Snippets.