problem2.33: problem2.33
In nganbaohuynh/stat210: Datasets for the course STAT210 (NMBU)
problem2.33 R Documentation
problem2.33
Description
Data from Exercise 2.33 in "Montgomery, D. Design and Analysis of Experiments. 9th Ed. Wiley."
Usage
problem2.33
Format
Twenty observaions on etch uniformity on cilicon wafers are taken during a qualification experiment for a plasma etcher.
Examples
summary(problem2.33)
nganbaohuynh/stat210 documentation built on Aug. 20, 2022, 10:08 p.m.
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| problem2.33 | R Documentation |
problem2.33
Description
Data from Exercise 2.33 in "Montgomery, D. Design and Analysis of Experiments. 9th Ed. Wiley."
Usage
problem2.33
Format
Twenty observaions on etch uniformity on cilicon wafers are taken during a qualification experiment for a plasma etcher.
Examples
summary(problem2.33)
R Package Documentation
Browse R Packages
We want your feedback!
Note that we can't provide technical support on individual packages. You should contact the package authors for that.
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