Description Usage Format Source References See Also
An experiment to reduce the variability of the thickness of an "epitaxial layer" deposited onto silicon wafers during the manufacture of integrated circuit devices. Wafer 2 is the treatment combinations and response variables presented Chapter 15, Table 15.26.
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A data frame of 16 rows and 10 variables. (See Table 15.24 for explanation of treatment factors and their levels for the experiment.)
http://www.wright.edu/~dan.voss/bookdata/data.html
Dean, A. and Voss, D. (1999). Design and Analysis of Experiments. New York, Springer.
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