ETCHRATE: Data on the Rate of Etching

ETCHRATER Documentation

Data on the Rate of Etching

Description

Rate of removal of field oxide in a semiconductor plasma etching process.

Usage

data(ETCHRATE)

Source

Digital Equipment Corporation (1988).

Examples

data(ETCHRATE)

hist(ETCHRATE)

mistat documentation built on March 7, 2023, 6:43 p.m.