ETCHRATETWO: Data on the Rate of Etching (two samples)

Description Usage Format Source Examples

Description

Rate of removal of field oxide in two different semiconductor plasma etching processes, A and B.

Usage

1

Format

A data frame with 12 observations on the following 2 variables.

A

a numeric vector, rate of etching, sample A

B

a numeric vector, rate of etching, sample B

Source

Digital Equipment Corporation (1988).

Examples

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2
3

mistat documentation built on April 18, 2021, 5:07 p.m.