ETCHRATETWO | R Documentation |
Rate of removal of field oxide in two different semiconductor plasma etching processes, A and B.
data(ETCHRATETWO)
A data frame with 12 observations on the following 2 variables.
A
a numeric vector, rate of etching, sample A
B
a numeric vector, rate of etching, sample B
Digital Equipment Corporation (1988).
data(ETCHRATETWO) boxplot(values ~ ind, data=stack(ETCHRATETWO))
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