ETCHRATETWO: Data on the Rate of Etching (two samples)

ETCHRATETWOR Documentation

Data on the Rate of Etching (two samples)

Description

Rate of removal of field oxide in two different semiconductor plasma etching processes, A and B.

Usage

data(ETCHRATETWO)

Format

A data frame with 12 observations on the following 2 variables.

A

a numeric vector, rate of etching, sample A

B

a numeric vector, rate of etching, sample B

Source

Digital Equipment Corporation (1988).

Examples

data(ETCHRATETWO)

boxplot(values ~ ind, data=stack(ETCHRATETWO))

mistat documentation built on March 7, 2023, 6:43 p.m.